Integrated circuit fabrication : science and technology / James D. Plummer, Stanford University, California, Peter B. Griffin, Stanford University, California.

Includes bibliographic references and index.

Chapter 1 : Historical Perspective, Moore’s Law and Future Technology Prospects
Chapter 2 : Modern Complementary Metal-Oxide - Semiconductor (CMOS) Technology
Chapter 3 : Semiconductor Materials: Crystal Growth, Wafer Preparation and Material Properties
Chapter 4 : Semiconductor Manufacturing: Cleanrooms, Wafer Cleaning, Gettering and Chip Yield
Chapter 5 : Lithography
Chapter 6 : Semiconductor/Insulator Interfaces
Chapter 7 : Doping in Semiconductors
Chapter 8 : Ion Implantation
Chapter 9 : Etching Technologies and Chemical - Mechanical Polishing
Chapter 10 : Deposition Technologies
Chapter 11 : Back-End (Interconnect) Processing Technologies
Appendix 1 : Basics of Semiconductor Materials in Equilibrium
Appendix 2 : Standard Prefixes
Appendix 3 : Useful Conversions
Appendix 4 : Physical Constants
Appendix 5 : Physical Properties of Silicon
Appendix 6 : Properties of Insulators Used in Semiconductor Technology
Appendix 7 : Color Chart for Thermally Grown SiO2 Films Observed Perpendicularly under Daylight Fluorescent Lighting
Appendix 8 : Irvin Curves
Appendix 9 : Error Function
Appendix 10 : List of Important Symbols
Appendix 11 : List of Common Acronyms

"Master fundamental technologies for modern semiconductor integrated circuits with this definitive textbook, for students from a range of STEM backgrounds, with a focus on big-picture thinking and industry-grade simulation. Includes over 450 full-color figures and over 280 homework problems, with solutions and lecture slides for instructors"-- Provided by publisher.

Plummer, J. D., & Griffin, P. B. (2024). Integrated circuit fabrication: Science and technology. Cambridge University Press.